The novel features of an asymmetric double gate single halo (DG-SH) doped SOI MOSFET are explored theoretically and compared with a conventional asymmetric DG SOI MOSFET. The two- dimensional numerical simulation studies demonstrate that the application of single halo to the double gate structure results in threshold voltage roll-up, reduced DIBL, high drain output resistance, kink free output characteristics and increase in the breakdown voltage when compared with a conventional DG structure. For the ﬁrst time, we show that the presence of single halo on the source side results in a step function in the surface potential, which screens the source side of the structure from the drain voltage variations. This work illustrates the beneﬁts of high performance DG-SH SOI MOS devices over conventional DG MOSFET and provides an incentive for further experimental exploration.
Keywords: Silicon-on-insulator (SOI); Double Gate (DG) SOI MOSFET; Channel engineering; Single halo (SH)
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